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Growth, structure and thermal reduction of MOCVD-deposited Fe films on Al2O3 (0001) substrates
Low-pressure metal-organic chemical vapor deposition Magnetic properties Thermal reduction
2011/12/8
Fe films with strong preferred orientation were prepared on Al2O3 (0 0 0 1) substrates by a new two-step method using low-pressure metal-organic chemical vapor deposition (LP-MOCVD) method. X-ray diff...