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Substrate Effect on Plasma Clean Efficiency in Plasma Enhanced Chemical Vapor Deposition System
Substrate Effect Plasma Clean Efficiency Plasma Chemical Vapor Deposition System
2010/12/6
The plasma clean in a plasma-enhanced chemical vapor deposition (PECVD) system plays an important role to ensure the same chamber condition after numerous film depositions. The periodic and applicable...
Vector Kirchhoff Analysis for The Study of Rectangular Microstrip Antennas Immersed in a Plasma
Vector Kirchhoff Analysis Rectangular Microstrip Antennas a Plasma
2010/12/15
The radiation properties of a microstrip antenna immersed in an ionized medium have since been studied using potential function technique and linearized hydrodynamic theory. In the present paper, Vect...
This paper is devoted to the analysis of the Plasma-Optical Effect in GaAs PIN photodiodes operating at the infrared range. An approximated expression for the variation of the refractive index in the ...